| 
        
        
            
              | Process characteristics: | 
            
            | 1st bonded material Bondpad material on the die.  | 
             | 
            
            | 2nd bonded material Bondpad material on the package.  | 
             | 
            
            | Number of bond wires Number of bond wires per chip.  | 
             | 
            
            | Wire material Bond wire material.  | 
             | 
            
            | Ambient Ambient to which substrate is exposed during processing  | 
            air | 
            
            | Batch size | 
            1 | 
            
            | Excluded materials | 
            gold (category), copper | 
            
            | Min bond pad size Minimum characteristic dimension of bond pad.  | 
            100 µm | 
            
            | Min bond pad spacing Minimum spacing between bond pads.  | 
            100 µm | 
            
            
            
            | Equipment | 
            Wire bonder | 
            
            
            
              | Equipment characteristics: | 
            
            | Die dimension Characteristic dimension of dies (e.g., side length of square) the equipment can accept  | 
            3.75 inch | 
            
            | Die materials List of allowed materials for dies accepted by this equipment  | 
            alumina, silicon | 
            
            
            
              | Comments: | 
            
            
        
           | 
        
        
            
              | Extra terms | 
            
            
        
                  Customer agrees that wafers, masks, and other materials
        incorporating any process(es) provided by this fabrication site
        are to be used solely for non-commercial research
        purposes.
          |