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About MEMS
Line width measurement: View
Process Hierarchy
Bonding
Clean
Consulting
Deposition
Doping
Etch
LIGA
Lift off
Lithography
Mask making
Metrology
Electrical metrology
Geometric metrology
Miscellaneous metrology
Miscellaneous
Packaging
Polishing
Process technologies
Thermal
Unique capabilities
If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at
engineering@mems-exchange.org
or call us at (703) 262-5368
on front
Line width measurement
Process characteristics:
Line width
Expected line width.
Line width
Å
µm
nm
Expected line width.
unconstrained
Thickness
Thickness of layer in which line is formed (if known).
Thickness
Å
µm
nm
Thickness of layer in which line is formed (if known).
unconstrained
Sides inspected
The sides of the wafer inspected by the process
either
Equipment