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About MEMS
Soft bake: View
Process Hierarchy
Bonding
Clean
Consulting
Deposition
Doping
Etch
LIGA
Lift off
Lithography
Mask making
Metrology
Miscellaneous
Packaging
Polishing
Process technologies
Thermal
Anneal
Bake
Oxidation
Unique capabilities
If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at
engineering@mems-exchange.org
or call us at (703) 262-5368
Soft bake
Batch size
25
Process duration
25 min
Sides processed
both
Temperature
90 °C
Thermal duration
25 min
Wafer size
Wafer size
100 mm
150 mm
200 mm
Equipment
Prebake oven
Equipment characteristics:
Wafer holder
Device that holds the wafers during processing.
cassette
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
silicon, quartz (single crystal), glass (category), sapphire, silicon on sapphire
Wafer thickness
List or range of wafer thicknesses the tool can accept
200 .. 1000 µm
Comments:
Other wafer sizes can be accommodated, but wafers will be placed flat on a piece of foil (not loaded in a cassette).