Process Hierarchy

  1X maskmaking (Image Repeater)
Coating reflectivity
Reflectivity of the mask coating
0.48
Defect density
Density (by area) of defects of a given size (e.g., [email protected]).
< 0.05 pinholes/cm2
Feature geometry
Shape of feature with dimensions characterized by the minimum feature size
line
Field geometry
Shape of field with dimensions characterized by the maximum field size
square
Min feature size 1 µm
Reduction 5
Equipment Interserv IR maskmaker
Equipment characteristics:
File formats
List of CAD file formats supported (eg. GDSII, CIF)
gdsII
Mask coating
Mask coating material (eg. chrome).
chromium
Mask plate dimensions
Width, length, thickness of the mask plates (eg. 5x7x0.09 inch).
4x4x0.09 inch, 5x5x0.09 inch
Mask polarity
Polarity of the mask.
positive
Max aperture size
Size of pattern generator's maximum aperture (e.g., 1 mm)
20,000x20,000 um
Max field size 127 mm
Min aperture size
Size of pattern generator's minimum aperture (e.g., 2 um)
1x1 um
Comments:
  • Uses the reticle previously made. The mask layouts will be reviewed in IC station prior to making.