Single Point, Ellipsometric Film Thickness Measurement (Rudolph) |
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| Film thickness |
0.01 .. 2 µm |
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| Materials |
silicon dioxide on silicon, silicon nitride on silicon |
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| Refractive index |
1 .. 4 |
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| Wafer size |
|
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| Equipment |
Rudolph Ellipsometer |
| Equipment characteristics: |
| Batch sizes |
50 .. 150 mm: 1 |
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| Piece dimension Range of wafer piece dimensions the equipment can accept |
50 .. 150 mm |
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| Piece geometry Geometry of wafer pieces the equipment can accept |
circular, irregular, other, rectangular, triangular shard |
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| Piece thickness Range of wafer piece thickness the equipment can accept |
200 .. 800 µm |
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| Wafer geometry Types of wafers this equipment can accept |
1-flat, 2-flat, no-flat, notched |
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| Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
silicon, silicon carbide, silicon on insulator |
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| Wafer thickness List or range of wafer thicknesses the tool can accept |
200 .. 800 µm |
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