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About MEMS
Wafer dicing: View
Process Hierarchy
Bonding
Clean
Consulting
Deposition
Doping
Etch
LIGA
Lift off
Lithography
Mask making
Metrology
Miscellaneous
Packaging
Polishing
Process technologies
Thermal
Unique capabilities
If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at
engineering@mems-exchange.org
or call us at (703) 262-5368
Wafer dicing
Process characteristics:
Blade thickness
Preferred thickness of dicing blade (if known).
Blade thickness
µm
Preferred thickness of dicing blade (if known).
unconstrained
Die separation (X-direction)
Length of die including dicing streets.
Die separation (X-direction)
µm
mm
Length of die including dicing streets.
unconstrained
Die separation (Y-direction)
Width of die including dicing streets.
Die separation (Y-direction)
µm
mm
Width of die including dicing streets.
unconstrained
Resist coat substrate
Protect the front of the substrate with photoresist during dicing.
Resist coat substrate
no
yes
Protect the front of the substrate with photoresist during dicing.
Equipment