on front Sheet resistance measurement |
|
| Batch size |
1 |
| Current |
0.453 mA |
| Measurement aspect |
resistivity |
| Measurement unit |
Ohm/square |
| Setup time |
30 min |
| Sides inspected The sides of the wafer inspected by the process |
either |
| Wafer size |
|
| Equipment |
4-Point Probe |
| Equipment characteristics: |
| Wafer geometry Types of wafers this equipment can accept |
1-flat, 2-flat |
| Wafer holder Device that holds the wafers during processing. |
teflon chuck |
| Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
silicon |
| Wafer thickness List or range of wafer thicknesses the tool can accept |
300 .. 1000 µm |
| Comments: |
|