Process Hierarchy

If you are interested in this process, either by itself or as part of a longer processing sequence, please send us email at engineering@mems-exchange.org or call us at (703) 262-5368
on front
  Maskless photolithography (align/expose only)
on front
  1 Maskless Alignment
on front
  2 Maskless Exposure
Batch size 1
Sides processed either
Wafer size
Wafer size
Comments:
  • To use this process the customer must supply at least 5 test wafers as well as the photoresist and the photoresist developer necessary for process development.
  • $100.00 setup fee.
  • Minimum of 4 wafers.