SEM analysis Downa new system will be installed soon. |
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Process characteristics: |
Materials Material(s) to inspect.
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Batch size |
1 |
Process duration |
1 .. 4 hour |
Equipment |
JEOL SEM |
Equipment characteristics: |
MOS clean |
yes |
Piece dimension Range of wafer piece dimensions the equipment can accept |
10 .. 20 mm |
Piece geometry Geometry of wafer pieces the equipment can accept |
circular, irregular, other, rectangular, triangular shard |
Piece thickness Range of wafer piece thickness the equipment can accept |
100 .. 1000 µm |
Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
alumina, ceramic, Corning 1737, fused silica, gallium arsenide, glass (Hoya), glass-ceramic, indium phosphide, Pyrex (Corning 7740), quartz (fused silica), quartz (single crystal), sapphire, silicon, silicon on insulator, silicon on sapphire |
Comments: |
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