Ellipsometric Film Thickness Measurement |
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| Film thickness |
0.01 .. 2 µm |
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| Materials |
silicon nitride on silicon, silicon dioxide on silicon |
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| Refractive index |
1 .. 4 |
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| Wafer size |
|
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| Equipment |
Rudolph ellipsometer |
| Equipment characteristics: |
| Batch sizes |
100 .. 150 mm: 1 |
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| MOS clean |
yes |
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| Wafer geometry Types of wafers this equipment can accept |
1-flat, 2-flat, notched, no-flat |
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| Wafer materials List of wafer materials this tool can accept (not list of all materials, just the wafer itself). |
silicon on insulator, silicon |
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| Wafer thickness List or range of wafer thicknesses the tool can accept |
300 .. 900 µm |
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