| Photoresist Removal (for metallized wafers, no gold) |
| Down Stream Plasma Ashing / Stripping |
| Photoresist Descum (Ion 40) |
| Photoresist Strip (Plasmalab) |
| Photoresist Stripping (Ion 40) |
| Photoresist wet strip (PRS 3000) |
| Photoresist wet strip (acetone) |
| Polymer O2 ICP Etch |
| Silicon dioxide ISM High Density etch |
| Silicon dioxide RIE (Plasmalab) |
| Silicon nitride ISM high density etch |
| Silicon nitride RIE (PlasmaLab) |
| Photoresist strip (SU-8) |
| Photoresist ashing |
| Photoresist wet strip |
| Photoresist strip (O2 plasma) |
| Photoresist wet strip |
| Photoresist Strip |
| Photoresist ashing I (metal allowed) |
| Photoresist ashing II (metal allowed) |
