Xenon difluoride etch: Page 1 of 1

Xenon difluoride etching is a highly selective dry isotropic silicon etch, that can be performed with a wide variety of masking layers. It is extremely popular for performing undercut etches due to the high selectivity to metals and photoresist (i.e. these are excellent masking materials), and high etch/undercut rates. Xenon difluoride is a vapor phase etchant and as such avoids the problems often associated with wet processing.