Enerjet
Model
Type commercial
Comments
  • Fixtures exist to support 50mm, 75mm, and 100mm wafers. There is a small edge-exclusion along the entire wafer edge for these fixtures. Up to eight wafers may be sputtered with these fixtures.
  • Clamping fixtures exist to support irregular substrates from 25mm to 75mm wide. Sputter is blocked where clamping fingers hold sample.
  • For irregular samples 25mm to near 50mm wide up to 16 samples may be run per batch.
  • For irregular samples 50mm to 75mm wide only 8 samples can be run per batch.
Equipment Characteristics
Batch sizes 100 mm: 8, 25 .. 49 mm: 16, 50 .. 75 mm: 8
Wafer diameter(s)
List or range of wafer diameters the tool can accept
 50 mm, 75 mm, 100 mm
Wafer holder
Device that holds the wafers during processing.
 rotating orbital
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
 glass (category), silicon
Wafer thickness
List or range of wafer thicknesses the tool can accept
 100 .. 1000 µm