AlN Sputterer

Model AMS -200
Type commercial
Comments
  • AC Magnetron Reactive Ion Sputter
Equipment Characteristics
Batch sizes 100 mm: 1
MOS clean no
Wafer diameter(s)
List or range of wafer diameters the tool can accept
100 mm
Wafer geometry
Types of wafers this equipment can accept
1-flat, 2-flat, no-flat, notched
Wafer materials
List of wafer materials this tool can accept (not list of all materials, just the wafer itself).
silicon, silicon on insulator
Wafer thickness
List or range of wafer thicknesses the tool can accept
300 .. 1000 µm